A low-order IRC-based scheme for resonance damping and tracking control for Atomic Force Microscopy

A J Fleming, S S Aphale, S O R Moheimani

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationProceedings of the American Control Conference, Invited Session on Nanopositioning and AFM Applications, Seattle, WA, USA
Publication statusPublished - 2009

Cite this

Fleming, A. J., Aphale, S. S., & Moheimani, S. O. R. (2009). A low-order IRC-based scheme for resonance damping and tracking control for Atomic Force Microscopy. In Proceedings of the American Control Conference, Invited Session on Nanopositioning and AFM Applications, Seattle, WA, USA

A low-order IRC-based scheme for resonance damping and tracking control for Atomic Force Microscopy. / Fleming, A J; Aphale, S S; Moheimani, S O R.

Proceedings of the American Control Conference, Invited Session on Nanopositioning and AFM Applications, Seattle, WA, USA. 2009.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fleming, AJ, Aphale, SS & Moheimani, SOR 2009, A low-order IRC-based scheme for resonance damping and tracking control for Atomic Force Microscopy. in Proceedings of the American Control Conference, Invited Session on Nanopositioning and AFM Applications, Seattle, WA, USA.
Fleming AJ, Aphale SS, Moheimani SOR. A low-order IRC-based scheme for resonance damping and tracking control for Atomic Force Microscopy. In Proceedings of the American Control Conference, Invited Session on Nanopositioning and AFM Applications, Seattle, WA, USA. 2009
Fleming, A J ; Aphale, S S ; Moheimani, S O R. / A low-order IRC-based scheme for resonance damping and tracking control for Atomic Force Microscopy. Proceedings of the American Control Conference, Invited Session on Nanopositioning and AFM Applications, Seattle, WA, USA. 2009.
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M3 - Conference contribution

BT - Proceedings of the American Control Conference, Invited Session on Nanopositioning and AFM Applications, Seattle, WA, USA

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