Analysis of the H- ion emissive surface in the extraction region of negative ion sources

N. Kameyama, T. Fukuyama, S. Wada, Sylvain Kuppel, K. Tsumori, H. Nakano, A. Hatayama*, K. Miyamoto, A. Fukano, M. Bacal

*Corresponding author for this work

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Abstract

To understand the plasma characteristics in the extraction region of negative H- sources is very important for the optimization of H - extraction from the sources. The profile of plasma density and electrostatic potential in the extraction region with and without extraction grid voltage are analyzed with a 2D particle in cell modeling of the NIFS-RD H- sources. The simulation results make clear the physical process forming a double ion plasma layer (which consists only of positive H+ and negative H- ions) recently observed in the Cs-seeded experiments of the NIFS-RD source in the vicinity of the extraction hole and the plasma grid. The results also give a useful insight into the formation mechanism of the plasma meniscus and the H- extraction process for such double ion plasma.

Original languageEnglish
Article number02A721
Number of pages5
JournalReview of Scientific Instruments
Volume83
Issue number2
Early online date17 Feb 2012
DOIs
Publication statusPublished - 2012

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    Kameyama, N., Fukuyama, T., Wada, S., Kuppel, S., Tsumori, K., Nakano, H., Hatayama, A., Miyamoto, K., Fukano, A., & Bacal, M. (2012). Analysis of the H- ion emissive surface in the extraction region of negative ion sources. Review of Scientific Instruments, 83(2), [02A721]. https://doi.org/10.1063/1.3673495