Influence of substrate temperature and deposition rate on the structure of erbium films deposited on glass and a-C substrates

H. Savaloni*, M. A. Player, E. Gu, G. V. Marr

*Corresponding author for this work

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The structure of erbium films of 600 nm thickness deposited onto carbon (a-C) and glass substrates at 0.55 and 2.5 nm/s deposition rates for varying substrate temperatures is investigated. The cross section and surface structures are examined by electron microscope. Energy-dispersive x-ray diffraction is utilized for the structure analysis of these films. Results are compared with the results presented in H. Savaloni, M. A. Player, E. Gu, and G. V. Marr (to be published), for erbium films on molybdenum substrates. It is found that to produce films with strong preferred orientation on glass substrates low deposition rate (0.55 nm/s) is favorable. This is opposite to erbium on molybdenum substrates. The grain size of erbium films produced at higher deposition rate is much larger than those at lower deposition rate. The structure of thin films has implications for performance of multilayer reflectors, and preferred orientation may have other applications to x-ray instrumentation.

Original languageEnglish
Pages (from-to)1497-1500
Number of pages4
JournalReview of Scientific Instruments
Volume63
Issue number1
DOIs
Publication statusPublished - Jan 1992

    Fingerprint

ASJC Scopus subject areas

  • Instrumentation

Cite this