Nano-structural characteristics of Ti/glass and Ti/Mo films as a function of deposition rate and angle

H. Savaloni, M. H. Reissi, M. Shariati, Michael Antony Player

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Titanium films of 90 nm thickness were deposited under UHV condition at different deposition rates, ranging from 0.3 to 10.2 angstrom s(-1), at room temperature on glass and Mo substrates at two incidence angles of 8.5 degrees and 45 degrees. The samples were analyzed using XRD and AFM techniques. The grain sizes were obtained from AFM images, while the crystallite sizes and preferred orientation of the films were obtained from XRD profiles. Results show that Ti/glass films at 8.5 degrees angle of incidence show (002) preferred orientation, while at 45 degrees incidence angle, at lower deposition rates, films show an almost amorphous structure, which develops to a strong (002) preferred orientation for deposition rate of 1.6 angstrom s(-1), and again at much higher deposition rate of 10.2 angstrom s(-1) it changes to an amorphous structure. Ti/Mo films deposited at 45 degrees incidence angle showed (101) preferred orientation. (c) 2005 Elsevier B.V. All rights reserved.

Original languageEnglish
Pages (from-to)439-443
Number of pages4
JournalThin Solid Films
Volume515
Issue number2
DOIs
Publication statusPublished - 2006

Keywords

  • AFM
  • XRD
  • preferred orientation
  • angle of incidence
  • deposition rate
  • STRUCTURE ZONE MODEL
  • SUBSTRATE-TEMPERATURE
  • GRAIN-STRUCTURE
  • HARD COATINGS
  • ERBIUM FILMS
  • THIN-FILMS
  • GROWTH
  • TITANIUM
  • CU

Cite this

Nano-structural characteristics of Ti/glass and Ti/Mo films as a function of deposition rate and angle. / Savaloni, H.; Reissi, M. H.; Shariati, M.; Player, Michael Antony.

In: Thin Solid Films, Vol. 515, No. 2, 2006, p. 439-443.

Research output: Contribution to journalArticle

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abstract = "Titanium films of 90 nm thickness were deposited under UHV condition at different deposition rates, ranging from 0.3 to 10.2 angstrom s(-1), at room temperature on glass and Mo substrates at two incidence angles of 8.5 degrees and 45 degrees. The samples were analyzed using XRD and AFM techniques. The grain sizes were obtained from AFM images, while the crystallite sizes and preferred orientation of the films were obtained from XRD profiles. Results show that Ti/glass films at 8.5 degrees angle of incidence show (002) preferred orientation, while at 45 degrees incidence angle, at lower deposition rates, films show an almost amorphous structure, which develops to a strong (002) preferred orientation for deposition rate of 1.6 angstrom s(-1), and again at much higher deposition rate of 10.2 angstrom s(-1) it changes to an amorphous structure. Ti/Mo films deposited at 45 degrees incidence angle showed (101) preferred orientation. (c) 2005 Elsevier B.V. All rights reserved.",
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T1 - Nano-structural characteristics of Ti/glass and Ti/Mo films as a function of deposition rate and angle

AU - Savaloni, H.

AU - Reissi, M. H.

AU - Shariati, M.

AU - Player, Michael Antony

PY - 2006

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N2 - Titanium films of 90 nm thickness were deposited under UHV condition at different deposition rates, ranging from 0.3 to 10.2 angstrom s(-1), at room temperature on glass and Mo substrates at two incidence angles of 8.5 degrees and 45 degrees. The samples were analyzed using XRD and AFM techniques. The grain sizes were obtained from AFM images, while the crystallite sizes and preferred orientation of the films were obtained from XRD profiles. Results show that Ti/glass films at 8.5 degrees angle of incidence show (002) preferred orientation, while at 45 degrees incidence angle, at lower deposition rates, films show an almost amorphous structure, which develops to a strong (002) preferred orientation for deposition rate of 1.6 angstrom s(-1), and again at much higher deposition rate of 10.2 angstrom s(-1) it changes to an amorphous structure. Ti/Mo films deposited at 45 degrees incidence angle showed (101) preferred orientation. (c) 2005 Elsevier B.V. All rights reserved.

AB - Titanium films of 90 nm thickness were deposited under UHV condition at different deposition rates, ranging from 0.3 to 10.2 angstrom s(-1), at room temperature on glass and Mo substrates at two incidence angles of 8.5 degrees and 45 degrees. The samples were analyzed using XRD and AFM techniques. The grain sizes were obtained from AFM images, while the crystallite sizes and preferred orientation of the films were obtained from XRD profiles. Results show that Ti/glass films at 8.5 degrees angle of incidence show (002) preferred orientation, while at 45 degrees incidence angle, at lower deposition rates, films show an almost amorphous structure, which develops to a strong (002) preferred orientation for deposition rate of 1.6 angstrom s(-1), and again at much higher deposition rate of 10.2 angstrom s(-1) it changes to an amorphous structure. Ti/Mo films deposited at 45 degrees incidence angle showed (101) preferred orientation. (c) 2005 Elsevier B.V. All rights reserved.

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KW - angle of incidence

KW - deposition rate

KW - STRUCTURE ZONE MODEL

KW - SUBSTRATE-TEMPERATURE

KW - GRAIN-STRUCTURE

KW - HARD COATINGS

KW - ERBIUM FILMS

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KW - GROWTH

KW - TITANIUM

KW - CU

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