Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement

J N Wilson, Hicham Idriss

Research output: Contribution to journalArticle

79 Citations (Scopus)
Original languageEnglish
Pages (from-to)11284-11285
Number of pages2
JournalJournal of the American Chemical Society
Volume124
Issue number38
DOIs
Publication statusPublished - 25 Sep 2002

Keywords

  • CATALYSTS

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