Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement

J N Wilson, Hicham Idriss

Research output: Contribution to journalArticle

77 Citations (Scopus)
Original languageEnglish
Pages (from-to)11284-11285
Number of pages2
JournalJournal of the American Chemical Society
Volume124
Issue number38
DOIs
Publication statusPublished - 25 Sep 2002

Keywords

  • CATALYSTS

Cite this

Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement. / Wilson, J N ; Idriss, Hicham.

In: Journal of the American Chemical Society, Vol. 124, No. 38, 25.09.2002, p. 11284-11285.

Research output: Contribution to journalArticle

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