Potential photoacid generators based on oxime sulfonates

M John Plater (Corresponding Author), William T A Harrison, Ross Killah

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Abstract

The bis-oxime of acenaphthenequinone and the mono-oxime of benzil have been sulfonated by reaction with 4-methylbenzenesulfonyl chloride and propylsulfonyl chloride. The four sulfonated oximes were characterised by X-ray single crystal structure determinations. Some photochemical decompositions were studied using a 6 W 254 nm immersion well lamp in dichloromethane. The 4-methylbenzenesulfonate bis-oxime of acenaphthenequinone and the 4-methylbenzenesulfonate mono-oxime of benzil both give 4-methylbenzenesulfonic acid upon irradiation but not 4-methylbenzenesulfinic acid. Fragmentation pathways are discussed. The possible use of these compounds as photoacid generators in polymer resists and the role of secondary reactions to liberate acid is discussed.
Original languageEnglish
Pages (from-to)26-33
Number of pages9
JournalJournal of Chemical Research
Volume43
Issue number1-2
DOIs
Publication statusPublished - 13 May 2019

Keywords

  • photoacid generator (PAG)
  • oxime sulfonates
  • acenaphthenequinone
  • benzil
  • Benzil
  • Acenaphthenequinone
  • Oxime sulfonates
  • Photoacid generator

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