Abstract
The bis-oxime of acenaphthenequinone and the mono-oxime of benzil have been sulfonated by reaction with 4-methylbenzenesulfonyl chloride and propylsulfonyl chloride. The four sulfonated oximes were characterised by X-ray single crystal structure determinations. Some photochemical decompositions were studied using a 6 W 254 nm immersion well lamp in dichloromethane. The 4-methylbenzenesulfonate bis-oxime of acenaphthenequinone and the 4-methylbenzenesulfonate mono-oxime of benzil both give 4-methylbenzenesulfonic acid upon irradiation but not 4-methylbenzenesulfinic acid. Fragmentation pathways are discussed. The possible use of these compounds as photoacid generators in polymer resists and the role of secondary reactions to liberate acid is discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 26-33 |
| Number of pages | 9 |
| Journal | Journal of Chemical Research |
| Volume | 43 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 13 May 2019 |
Keywords
- photoacid generator (PAG)
- oxime sulfonates
- acenaphthenequinone
- benzil
- Benzil
- Acenaphthenequinone
- Oxime sulfonates
- Photoacid generator
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Cite this
Plater, M. J., Harrison, W. T. A., & Killah, R. (2019). Potential photoacid generators based on oxime sulfonates. Journal of Chemical Research, 43(1-2), 26-33. https://doi.org/10.1177/1747519819831829