Abstract
| Original language | English |
|---|---|
| Pages (from-to) | 26-33 |
| Number of pages | 9 |
| Journal | Journal of Chemical Research |
| Volume | 43 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 13 May 2019 |
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Keywords
- photoacid generator (PAG)
- oxime sulfonates
- acenaphthenequinone
- benzil
- Benzil
- Acenaphthenequinone
- Oxime sulfonates
- Photoacid generator
ASJC Scopus subject areas
- Chemistry(all)
Cite this
Potential photoacid generators based on oxime sulfonates. / Plater, M John (Corresponding Author); Harrison, William T A; Killah, Ross.
In: Journal of Chemical Research, Vol. 43, No. 1-2, 13.05.2019, p. 26-33.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Potential photoacid generators based on oxime sulfonates
AU - Plater, M John
AU - Harrison, William T A
AU - Killah, Ross
N1 - We are grateful to the National Mass Spectrometry Foundation, University of Swansea, and to the National Crystallographic Service Center, University of Southampton.
PY - 2019/5/13
Y1 - 2019/5/13
N2 - The bis-oxime of acenaphthenequinone and the mono-oxime of benzil have been sulfonated by reaction with 4-methylbenzenesulfonyl chloride and propylsulfonyl chloride. The four sulfonated oximes were characterised by X-ray single crystal structure determinations. Some photochemical decompositions were studied using a 6 W 254 nm immersion well lamp in dichloromethane. The 4-methylbenzenesulfonate bis-oxime of acenaphthenequinone and the 4-methylbenzenesulfonate mono-oxime of benzil both give 4-methylbenzenesulfonic acid upon irradiation but not 4-methylbenzenesulfinic acid. Fragmentation pathways are discussed. The possible use of these compounds as photoacid generators in polymer resists and the role of secondary reactions to liberate acid is discussed.
AB - The bis-oxime of acenaphthenequinone and the mono-oxime of benzil have been sulfonated by reaction with 4-methylbenzenesulfonyl chloride and propylsulfonyl chloride. The four sulfonated oximes were characterised by X-ray single crystal structure determinations. Some photochemical decompositions were studied using a 6 W 254 nm immersion well lamp in dichloromethane. The 4-methylbenzenesulfonate bis-oxime of acenaphthenequinone and the 4-methylbenzenesulfonate mono-oxime of benzil both give 4-methylbenzenesulfonic acid upon irradiation but not 4-methylbenzenesulfinic acid. Fragmentation pathways are discussed. The possible use of these compounds as photoacid generators in polymer resists and the role of secondary reactions to liberate acid is discussed.
KW - photoacid generator (PAG)
KW - oxime sulfonates
KW - acenaphthenequinone
KW - benzil
KW - Benzil
KW - Acenaphthenequinone
KW - Oxime sulfonates
KW - Photoacid generator
UR - http://www.scopus.com/inward/record.url?scp=85066130858&partnerID=8YFLogxK
UR - http://www.mendeley.com/research/potential-photoacid-generators-based-oxime-sulfonates
U2 - 10.1177/1747519819831829
DO - 10.1177/1747519819831829
M3 - Article
VL - 43
SP - 26
EP - 33
JO - Journal of Chemical Research
JF - Journal of Chemical Research
SN - 0308-2342
IS - 1-2
ER -